Unspecific background lines are another phenomenon that can affect the measurement quality. When analyzing chemical products such as urea, fertilizers or etching solutions, it is also possible for several lines to overlap simultaneously. Often there is a direct overlap of two spectral lines. In ores or metals, for example, rare earths, iron, and refractory metals can cause distortions. High-matrix samples have complex spectra that are the cause of a large number of measurement interferences of the spectrometer. sudden change in matrix load can cause plasma to collapse.significant loss of sensitivity and thus loss of detection strength.intensity shift from ionic to atomic lines.change in electron density due to high levels of easily ionizable elements (alkaline, alkaline earth).This can have significant effects on the measurement results. High-matrix samples significantly influence the stability and performance characteristics of the plasma. The plasma performance of the ICP-OES is crucial for the detection of trace elements in the sample. For best analytical performance, as little dilution as possible is required. Although matrix deposition can be minimized by sample dilution, the ability of the ICP-OES spectrometer to detect the analytes (low LODs) is reduced at high dilution ratios. increased risk of spectral interferenceĭiluting the samples solves only a few of these issues.drag effects and increased background noise.insufficient detection limits to detect trace elements.loss of sensitivity due to plasma-based interference.
The analytical challenges of high matrix samples are Modern ICP-OES systems such as the PlasmaQuant 9100 therefore use a vertically oriented flare, which significantly minimizes the risk of deposits and ensures longer lifespan, less maintenance and more efficient operation of the spectrometer. These deposits cause increased background noise and falsify the results. Many older ICP systems use a horizontal orientation of the plasma flare, which is very susceptible to deposits at the injector tip. This plays a key role in preventing matrix deposition. One example is the alignment of the plasma flare. However, many older ICP-OES on the market have their difficulties with these samples, as they are not primarily optimized for this type of sample. The efficient and reliable analysis of high-matrix samples requires the appropriate technology. high cleaning and maintenance effort and high costs for consumables.short service life of the glass components due to local matrix deposits.Signal fluctuation/drift due to dirty atomizers and injectors.The most common difficulties concern the long-term measurement stability and the amount of effort for the user: For the user this means a lot of additional maintenance and cleaning. Especially the effects on the quality of results and the high demands on the analytical instrument must be emphasized. High-matrix samples cause several challenges during the analysis process. Geldocumentation, Chemiluminescence & Fluorescence ImagerĬhallenges of analysis with ICP-OES techniques.
0 kommentar(er)
